Ga2O3

Ga2O3 Targets

4N Ø100×8mm ＞80%

4N Φ50.8mm；Φ76.2mm；Φ101.6mm

Powder: 5N 2-5μm 50g；100g；500g；1kg

Advantage
1. the content of the impurity elements is very low
2. good electrical conductivity, product density is good
3. the preparation is usually made by chemical refining, electrolysis refining, extraction refining, etc.

Application:
Magnetron sputtering coating material;

Packaging:
Vacuum packaging / vacuum neutral packing / special packaging reinforcement packaging

Manufacturing process:
Chemical refining, electrolytic refining, extraction refining, etc.

Applicable instrument
Various types of magnetron sputtering equipment

Date of delivery
Single piece material delivered within 1 weeks, batch material 7 to 10 working days delivery;

MOQ
target:1pc' powder:100g

Ga2O3 Images